Product

overview

Features

Flexible module configurations
Wafer sizes Ø6” – 8”
Easy to operating, maintain and service set up
Able to conversion for 6” wafer to 8 “ wafer
Provide In-line system with ASML / Cannon/ Nikon.
Reduce process time for WEE(EEW) solution ( Flat type / Notch Type within 30Sec)
Temperature & Humidity Control
PR / DEV solution Temp Control
Spin Motor Temp Control
Chemical Flow Monitoring system.
Flip PR supply system with barcode detection( Option )
Design for Explosion hazard proof type for chemical supply system
SECS GEM / HSMS solution for RTM system
Stainless steel frame
Transparent doors for safe process observation
Auto Centering positioned high speed robot
All system components integrated into the main cabinet
Clean room design for class 10
All components easy to reach for maintenance and service

Controller & Software

Standard PC for operating and recipe storage
21“ flat touch screen monitor (one or More)
USV for safety computer shot down
Ethernet interface for connection to intranet
Interface for first level service communication
Log-file tracking
Unlimited process recipe and flow recipe storage
Easy to operate user interface Windows-based
Portable Pad for service including
RTM for Temp / Flow for chemical
Fab automation – SECS/GEM / HSMS

Cassette Stage

4 stations Loading and unloading for 6“ to 8“ wafer size
Uni-cassette mode / Double flow process
Carrier detection switch
Individual Wafer mapping
Empty slot detection
Double wafer detection
Wafers cross detection
Wafer out of cassette detection
Wafers down to 300 μm thickness
Able to handling for glass wafer

Wafer Handling Robot

All axis motor driven
Software programmable in speed and position
Dual arm wafer transfer
Easy teaching procedure by Portable Pad
High speeds possible

Coating Process Module

For a wide range of PR viscosity
Static or dynamic dispense via recipe programmable Dispense Arm
Different dispense systems for various types of PR available
Brushless digital servomotor
Speed up to 6,000 rpm
Programmable dispense arm
Programmable EBR Nozzle
Fixed BSR nozzle
Programable Pre-wet(RRC) Nozzle
Up to 4 different dispense lines
Recipe programmable for dispense & suck-back
Temp control for PR dispense line
Temp control for Motor Flange
Temp and Humidity control for chamber
Chemical Flow Monitoring system - Pin Flow system

Develop Process Module

Static or dynamic dispense via recipe programmable Dispense Arm
Different dispense systems for various types of Develop solution available
Brushless digital servomotor
Speed up to 6,000 rpm
Programmable dispense arm
Programmable DI Nozzle
Fixed BSR nozzle
Programable Pre-wet Nozzle
Up to 2 different dispense lines
Recipe programmable for dispense & suck-back
Temp control for Develop dispense line
Temp control for Motor Flange
Chemical Flow Monitoring system – Pin Flow system